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Wong A.K.-K. Resolution Enhancement Techniques in Optical Lithography

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Wong A.K.-K. Resolution Enhancement Techniques in Optical Lithography
SPIE — The International Society for Optical Engineering Press, Washington, 2001, 232 pages, ISBN: 0819439959
SPIE Tutorial Texts in Optical Engineering Vol. TT47
This tutorial summarizes optical lithography enhancement research and development over the past 20 years. Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.
Foreword
List of symbols
Optical imaging and resolution
Modified illumination
Optical proximity correction
Alternating phase-shifting mask
Attenuated phase-shift mask
Selecting appropriate RETs
Second-generation RETs
Concluding remarks
k1 conversion charts
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