Van Roosmalen A.J., Baggerman J.A.G., Brader S.J.H. Dry Etching for VLSI

N.-Y., L.: Plenum Press, 1991. — 260 p. — Updates in Applied Physics and Electrical Technology. - ISBN: 0306438356, 9780306438356.
This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing.The Plasma State.
The AC Discharge.
Gas and Surface Processes.
Reactor Technology.
Etch Processes.
Diagnostics and Endpoint Detection.Selected Abstracts.