Neralla S. Chemical Vapor Deposition: Recent Advances and Applications in Optical, Solar Cells and Solid State Devices

ExLi4EvA, 2016. — 285 p. — ISBN: 9535125737; 9789535125730This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields.
CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.Preparation and Characterization of Carbon Nanofibers and its Composites by Chemical Vapor Deposition
Non-Classical Crystallization of Thin Films and Nanostructures in CVD Process
MOCVD Grown HgCdTe Heterostructures
Hot Filament Chemical Vapor Deposition: Enabling the Scalable Synthesis of Bilayer Graphene and Other Carbon Materials
In Situ Observation of Chemical Vapour Deposition Using Langasite Crystal Microbalance
Low‐Temperature PureB CVD Technology for CMOS Compatible Photodetectors
Silicon-Rich Oxide Obtained by Low-Pressure Chemical Vapor Deposition to Develop Silicon Light Sources
High‐Density Plasma‐Enhanced Chemical Vapor Deposition of Si‐Based Materials for Solar Cell Applications
Applications of CVD to Produce Thin Films for Solid‐State Devices
Plasma-Enhanced Chemical Vapor Deposition: Where we are and the Outlook for the Future