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Sherman A. Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications

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Sherman A. Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications
St ed. - Park Ridge, NJ: Noyes Publications, 1987. - xi, 215 p. - ISBN: 0815511361, 9780815511366, 9780815516392.
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Table of contents
MATERIALS SCIENCE AND PROCESS TECHNOLOGY SERIES
Preface
Contents
Fundamentals of Thermal CVD
Fundamentals of Plasma-Assisted CVD
Thermal CVD of Dielectrics and Semiconductors
Thermal CVD of Metallic Conductors
Plasma-Enhanced CVD
Production CVD Reactor Systems
Film Evaluation Techniques
Index
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