Marcel Dekker, CRC Press, 2002, 569 pages, ISBN: 0824706684 0203908325 0824744063 9780203908327 9780824744069
This volume presents a complete and thorough examination of advances in the instrumentation, evaluation, and implementation of UV technology for reliable and efficient data acquisition and analysis. It provides real-world applications in expanding fields such as chemical physics, plasma science, photolithography, laser spectroscopy, astronomy and atmospheric science
Ultraviolet and Vacuum Ultraviolet Sources and Materials for Lithography
Laser Optogalvanic Spectroscopy of Discharge Plasmas in the Ultraviolet Region
Spectra of the Isotopomers of CO+, N2+, and NO in the Ultraviolet
Photoabsorption Cross-Section Measurements in the Ultraviolet and Vacuum Ultraviolet
Ultraviolet and Vacuum Ultraviolet Laser Spectroscopy Using Fluorescence and Time-of-Flight Mass Detection
Spectroscopy and Applications of Diatomic and Triatomic Molecules Assisted by Laser Light at 157.6 nm
Tunable Solid-State Ultraviolet and Vacuum Ultraviolet Lasers
VUV Laser Spectroscopy of Trivalent Rare-Earth Ions in Wide Band Gap Fluoride Crystals
Spectroscopy of Broad-Band UV-Emitting Materials Based on Trivalent Rare-Earth Ions
All-Solid-State, Short-Pulse, Tunable, Ultraviolet Laser Sources Based on Ce3+-Activated FluorideCrystals
Diode-Pumped Picosecond UV Lasers by Nonlinear Frequency Conversions
Atmospheric Ultraviolet Spectroscopy
Ultraviolet Spectroscopy in Astronomy